NEXUS Oxidation Module
Form Ultra-Thin Nano Oxide and Tunnel Barrier Layers
Veeco's NEXUS Oxidation modules provide versatility for formation of ultra-thin nano oxide and tunnel barrier layers. Natural Oxidation, Remote Plasma and Ion Beam Oxidation techniques allow the oxidation process to be optimized for the application.
- Description
- Application
Notes
NEXUS Oxidation Module
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More Information |
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- Versatility for formation of ultra-thin nano oxide and tunnel barrier layers
- Natural Oxidation, Remote Plasma and Ion Beam Oxidation techniques allow the oxidation process to be optimized for the application
- Designed to be easily clustered on Veeco's NEXUS hardware and software platform
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Contact Veeco for detailed specifications
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- Cost-Effective Thin-Film Bulk Acoustic Resonator (FBAR) Production
- Advanced Sensor Fabrication Using Integrated Ion Beam Etch and Ion Beam Deposition Processes
- Applications of Reactive Ion Beam Etching to Thin Film Magnetic Head Track-Width Trimming
- Reactive Ion Beam Etching of InP
