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Process Equipment : Ion Beam Deposition

SPECTOR Large Area Planetary Ion Beam Deposition System New product

SPECTOR Large Area Planetary Ion Beam Deposition System
Increased throughput and excellent material uniformity

Veeco's SPECTOR Large Area Planetary Ion Beam Deposition System combines unsurpassed ion beam film quality with batch sizes near that of e-beam systems.  In addition to a larger overall coating area, the robust fixture supports processing monolithic substrates up to 400mm in diameter and 100mm thick.  Veeco has included our 16cm RF high-power deposition source and ultra-low contamination RF neutralizers to ensure high deposition rates and film quality.  For maximum stoichiometry control and in-situ substrate pre-cleaning or etch support, the system is also equipped with our 12cm RF assist ion source.

SPECTOR Large Area Planetary                                                  Ion Beam Deposition System

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  • Ion beam quality with industry-leading throughput provides the lowest cost of ownership
  • Exceptional material uniformity across 400mm planets ensures maximum product yield
  • High current RF ion sources provide excellent deposition rates
  • Maximum product flexibility provided by large substrate and palette support

Worldwide Customer Support from the Industry Leader

Veeco is a leader of Process Equipment and Metrology solutions used by manufacturers in the Photonics, HB LED, solar, data storage, semiconductor, scientific research and industrial markets.  Manufacturing and engineering facilities are located in Arizona, California, Colorado, Massachusetts, Minnesota, New Jersey and New York.  Global sales and service offices are located throughout the United States, Europe, Japan and Asia Pacific.

  Contact Veeco for detailed specifications