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Process Equipment : Ion Beam Deposition

NEXUS LDD-IBD Ion Beam Deposition System

NEXUS LDD-IBD Ion Beam Deposition System
Ultra-thin single-layer and multi-layer film coatings

Deposit extremely thin single- and multi-layer film coatings for data storage and compound semiconductor devices with Veeco's NEXUS Low Defect Density Ion Beam Deposition (LDD-IBD) System. Specifically designed for low particulate deposition processes, it offers an ideal thin film technology platform for phase shift masks and next-generation lithography applications such as extreme ultra violet (EUV) masks.

NEXUS LDD-IBD Ion Beam Deposition System
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  • High performance, production-worthy system
  • Offers excellent uniformity and high repeatability
  • Based on award-winning technology
  • Can be integrated with other process modules into a cluster tool
  • Effective as a single module for R&D or pilot line applications.
   Contact Veeco for detailed specifications