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Process Equipment : Ion Beam Deposition

NEXUS IBD Ion Beam Deposition System

NEXUS IBD Ion Beam Deposition System
Ideal for hard bias, lead, insulation layer and sensor stack deposition

Data storage manufacturers can dramatically increase yield of 80Gb/in2 sensors, as well as meet the demands of future TFMH device fabrication with Veeco's third-generation NEXUS Ion Beam Deposition (IBD) System.

NEXUS IBD Ion Beam Deposition System
   More Information
 
  • Supports wide range of devices, from current CIP to advanced CPP devices
  • Ideal for MRAM applications as well as GMR and TMR thin film magnetic heads
  • Improved CD control for all collimated deposition applications
  • Sharper takeoff angle through symmetrical arrival of the deposition plume
  • Platform easily integrated with PVD, IBE and other technologies
   Contact Veeco for detailed specifications