Process Equipment
Diamond-like Carbon Deposition - Systems

Features:

• Industry's first production-worthy pulsed filtered cathodic arc
• Long throw, low pressure PVD
• Reactive PVD process capable
• Stable operation with tuneable low energy NEXUS 420 ion beam etch source
• Tilting ellipsometer facilitates etch and deposition end point control

Benefits:

• Exceptional uniformity, repeatability and film hardness
• Provides dense, pin-hole free silicon seed layer
• Improved step coverage for better process yields
• Longer-lasting slider overcoats and landing pads