Process Equipment : DLC Deposition Systems

NEXUS DLC-X Deposition System

Ultra-hard, corrosion-resistant TFMH coating film technology

Deposit dense, uniform and repeatable thin diamond-like carbon (DLC) films for longer lasting TFMH slider overcoats and landing pads with Veeco's NEXUS DLC-X System. The Nexus DLC-X features the industry's first production-worthy Pulsed Filtered Cathode Arc Source to enable sub-20A overcoat thickness, and supports improved step coverage for better process yield compared to previous generations.

Description

NEXUS DLC-X Diamond-Like Carbon Deposition System		More Information

Exceptional uniformity, repeatability and film hardness from pulsed filtered cathodic arc Long throw, low pressure PVD provides dense, pin-hole free silicon seed layer Reactive PVD process capable Tunable low energy NEXUS 420 ion beam etch source results in stable operation down from 75 volt to 300 volt beam energies Tilting ellipsometer facilitates etch and deposition end point control		Contact Veeco for detailed specifications