Metrology & Instrumentation
Atomic Force Microscopes
Automated AFM / AFP
Optical Interferometric Profilers
Confocal Microscopes
Stylus Profilers
Nanotheater
Veeco Probes
 
Epitaxial Equipment
MBE Components
MBE Sources
MBE Systems
MOCVD Systems
 
Process Equipment
Diamond-like Carbon Deposition
Ion Beam Deposition
Ion Beam Etch Systems
Ion Sources
Physical Vapor Deposition
Lapping/Dicing Systems
Thermal Deposition Sources
CIGS Coating Systems
 
Solutions for a nanoscale world.™
 

Epitaxial Equipment : MOCVD Systems

E300 LDM MOCVD System

E300 LDM MOCVD System
Reliable production of long wavelength, infrared and visible lasers

To get process control and reliability formerly unavailable for large-scale metal organic chemical vapor disposition (MOCVD) production, turn to the Veeco E300 LDM. It's engineered for high-volume production of long-wavelength, infrared and visible lasers, VCSELs, and InP-based materials. The E300 LDM features next-generation growth chamber and FlowFlange® designs, exclusive TurboDisc® technology, and the RealTemp® optical system for in-situ monitoring and control of wafer temperature. Result: exceptional material quality and process efficiency.

TurboDisc E300 LDM As/P MOCVD System
   More Information
 
  • Unsurpassed process control and reliability for large-scale MOCVD production
  • Next-generation growth technology provides unprecedented run-to-run process control for highest repeatability
  • Can be combined with glove box system for extremely clean wafer transfer and acoustic measurement for precise control of process gases
  • Exceptional source efficiency provides the industry's lowest cost of ownership and highest throughput; low maintenance yields high uptime
  • Low production costs due to large batch sizes, minimal time between runs, and unmatched process control
   Contact Veeco for detailed specifications