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Epitaxial Equipment : MOCVD Systems

D180 LDM MOCVD System

D180 LDM MOCVD System
Unmatched process control for laser diode materials

Achieve exceptional uniformity of thickness, doping, and composition within grown epitaxial layers with Veeco's D180 LDM metal organic chemical vapor deposition (MOCVD) system. It's fully configured for InGaAsP, InGaAlP, and AlGaAs laser diode production and features the exclusive RealTemp® optical control system, for in-situ monitoring and temperature control, and a vertical rotating disc reactor. A vertical growth chamber enhances particulate control, and FlowFlange® design allows for precise control of uniformity, layer thickness, and sharp interface abruptness.

TurboDisc Discovery D180 LDM MOCVD System
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  • Engineered specifically for control and reliability in high-volume MOCVD production of long wavelength, infrared and visible lasers, VCSELs, and InP-based electronic materials
  • Next-generation growth chamber and FlowFlange designs plus RealTemp 200 in-situ wafer temperature monitoring and control improve run-to-run reproducibility
  • Glove box system available for extremely clean wafer transfer and acoustic measurement system offers precise mass flow control
  • E300LDM growth chamber improves flow conditions, efficiently uses reactants in high-volume production
  • Unparalleled control of sensitive material processes leads to excellent wafer uniformity
   Contact Veeco for detailed specifications