Epitaxial Equipment
MBE Systems - Systems

Features

• Automated architecture
• Application flexibility
• Economical upgrade path
• Built on nine years of reliable cluster tool technology

Benefits

• Automated wafer transfer enables high system utilization, allowing multiple researchers to use the system at the same time and perform unattended growths and calibrations
• Economical upgrade path to additional growth modules, maximum of three
• Configurable, material specific growth modules in a cluster architecture enable growth of incompatible materials in one vacuum system
• Direct process path to larger production MBE systems

Features

• Vertical source substrate geometry for optimum material capacity of sources
• Configurable cryopanel, manipulator, shutters, and in-situ monitoring equipment 
• 12 MBE source ports with option to include e-beam capabilities
• Multiple, large, direct-coupled pumping ports
• Economical upgrade path to additional growth modules, maximum of two
• Manual or automatic transfer

Benefits

• Maximum uptime
• Better control and greater purity of growth environment
• Enables advanced research on wide variety of challenging materials
• Efficient research and process development at a low cost of ownership
• Option to add automated cluster tool in the future 

Features:

• Automated, modular architecture
• Design allows for up to two growth modules
• Optional bulkhead installation, to separate load lock modules from cluster tool and growth modules

Benefits:

• Proven lowest cost multi-4" system in industry
• Significantly smaller footprint than comparable MBE tools
• High throughput
• Allows for processing of incompatible materials
• Easier maintenance
• Reliable design

Features:

• Automated, modular architecture
• Design allows for up to two growth modules
• Optional bulkhead installation, to separate load lock modules from cluster tool and growth modules

Benefits:

• Proven industry's lowest cost per wafer processing
• 40%-60% smaller footprint than comparable MBE systems
• Greatly increased throughput
• Allows for processing of incompatible materials
• Easy maintenance
• Optimizes cleanroom space
• Reliable design

Features

• Up to 1x3" wafer processing
• Modular design
• Integrates wide range of in-situ monitoring techniques
• 11 source ports on tilted vertical geometry 
• Incorporates technology of Veeco GEN II MBE system, which holds GaAs and AlGaAs performance records

Benefits

• Maximum flexibility in choosing arrangement of source materials
• Maximum choice of monitoring techniques
• Expandable system capabilities as needed
• Based on production-proven technology

Features:

• Radial-vane source cryopanel complements standard growth chamber cryopanel
• Pneumatically actuated source shutters
• Easily accommodates various analyical techniques
• Precise substrate rotation with accurate beam equivalent pressure measurement

Benefits:

• Cost-effective and efficient system ideal for research and product development
• Well suited to high-quality, high-purity optoelectronic materials applications
• Superior facility and application flexibility
• Record-setting track record with more than 220 systems in operation worldwide